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Partnership Spotlight: The Value of CeramTec for High-Tech Components

Explore the value of advanced ceramics and CeramTec hermetic components for high-tech applications, delivering proven reliability in UHV, high-temperature and extreme environments.

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Reliable Control for Precision Thin Film Deposition

Learn how INFICON thin film deposition monitors and the Zevision® IMC300 controller, supported by Testbourne, deliver precise, reliable thickness and rate control.

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Partner in Precision: How RD Mathis Evaporation Sources Empower Thin Film Innovation

Explore RD Mathis thermal evaporation sources including filaments, boats and crucibles designed for stable, repeatable thin film deposition in R&D and industry.

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How to Choose the Right High-Vacuum Components for Research Labs

Choosing the right high-vacuum components isn’t just a procurement task. It’s a critical decision that directly affects your research outcomes.

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Why Tungsten Carbide Is Critical for High-Wear and High-Temperature Industrial Applications

Tungsten carbide is the industry standard for extreme hardness and heat resistance. Discover why Testbourne’s cobalt-free WC targets are essential for mission-critical PVD applications.

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How Surface Preparation Affects Thin Film Performance

Surface preparation is a critical variable in PVD coating integrity. Learn how achieving active surfaces ensures thickness uniformity and film integrity in high-vacuum deposition.

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How to Choose the Right Sputtering Target for Your Application

Selecting a sputtering target requires careful consideration of material, purity, manufacturing quality and thermal management. Each element plays a role in thin-film deposition performance, stability and long-term process consistency.

Content

How Universities and Research Laboratories Source Specialist Materials for PVD Applications

Universities and research laboratories often require specialist materials manufactured to precise specifications. Explore how material selection, technical requirements and supplier expertise influence the sourcing process.

Material

A1-10001-P

Al Powder (spherical) -200 +400 mesh 99.99% Pure Aluminium UN1396 4.3 PG II

Material

A1-10006-P

Al Powder -325 Mesh 99.9% Pure Aluminium UN1396 4.3 PG II

Material

A1-10017-P

Al2C3 -325 Mesh (typ. =10 microns) 99.9% Pure Aluminium Carbide UN1394 4.3 PG II

Material

A1-10018-P

Al2C3 -325 Mesh (typ. =10 microns) 99% Pure Aluminium Carbide UN1394 4.3 PG II

Material

A1-10019-P

AlCl3 -10 Mesh 99.999% Pure Aluminium Chloride UN1726 8 PGII

Material

A1-1001-W

Al Wire 0.1mm dia. 99.9% Pure Aluminum

Material

A1-10020-P

AlCl3 -10 Mesh 99.9% Pure Aluminium Chloride UN1726 8 PG II

Material

A1-10021-P

AlF3 -4 Mesh 99.997% Pure Aluminium Fluoride UN3260 8 PG II

Material

A1-10022-P

AlF3 -100 Mesh 99.9% Pure Aluminium Fluoride UN3260 8 PG II

Material

A1-10022-P1

AlF3 Granules 1-4 mm 99.99% Pure Non-Hydrated Aluminium Fluoride UN3260 8 PG II

Material

A1-10023-P

Al(OH)3 -100 Mesh 99.9% Pure Aluminium Hydroxide

Material

A1-10027-P

AlN -200 Mesh (typ. =10 microns) 99.8% Pure Aluminium Nitride UN3131 4.3 PG III