MODEL RIE2000/3000 - Reactive Ion Etcher

MODEL RIE2000/3000 - Reactive Ion Etcher

Manufacturer: South Bay Technology, Inc.

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The RIE 2000/3000 Reactive Ion Etcher is specifically designed for anisotropic etching of microelectronic devices. This R&D sized instrument is designed to simulate the operation of larger production instruments in process development and pilot production applications. The RIE 2000/3000 is a turbo pumped system capable of reaching a base pressure of less than 10-6 torr. This low base pressure provides a clean etch environment and highly anisotropic etch without undercutting by eliminating residual species within the chamber prior to starting the etch process. The RIE-2000 model include as standard a two channel precision needle valve gas control and separate vent to atmosphere line. In replacement of the needle valve set up, the RIE-2000 can be equipped with up to two mass flow controller channels for accurate ratio of two species. The RIE-3000 can be equipped with up to five mass flow controller channels and in this case, the MFC controls are mounted into a stand alone cabinet connected to the main system. The RIE-3000 can ratio four process gas species to one species, if needed, or control the flows of each species independently. The rotational speed of the turbo pump can be controlled in order to set a precise pressure with the set mass flows.

Includes everything necessary to operate:
  • 200 watt RF Generator and manual matching network
  • Dual digital readout of forward and reflected power
  • Dual gas controls - (only on RIE2000)
  • Separate vent control
  • Stainless Steel Chamber
  • DC bias meter display
  • Digital termination timer
  • 6” water cooled sample stage
  • Turbo pump
  • Corrosive series rotary vane roughing pump
  • Capactiance manometer
  • Stainless steel gas distribution ring
  • Instruction manual
  • Quad Channel Power Supply/Readout (only on RIE3000)
  • Mass Flow Controller (only on RIE3000)
  • 1 -year warranty.

Read brochure …

RIE 2000 and 3000 - Accessories
DescriptionPart No.Price on request
Quartz Chamber, 8" OD x 5" highRIE2000-001
RF Shield for Quartz ChamberRIE2000-002
Stainless Steel Chamber with ViewportRIE2000-003
Oil free Diaphragm Pump to Back Turbo Pump (in place of rotary vane pump)RIE2000-004
One Mass Flow Controller with Single Channel Power Supply/ReadoutRIE2000-005
Two Mass Flow Controllers with Quad Channel Power Supply/ReadoutRIE2000-006
Cold Cathode Gauge for accurate reading of base pressure (requires stainless steel chamber RIE2000-003)RIE2000-008
Mass Flow Controller0550-014
Single Channel Power Supply/Readout0550-020
Quad Channel Power Supply/Readout0550-010