Plasma Sources

Manufacturer: Sairem Microwave Equipment

Price on request: Add to Inquiry Add to Wish List  


Standard 3 kW 2.45 GHz Downstream set-up
Standard 3 kW 2.45 GHz Downstream set-up

Downstream plasma source – 2.45 GHz


This surface wave type of plasma source generates plasma in a dielectric material tube (diameter 20-60 mm) placed in a standard WR340 waveguide. This plasma source enables the ignition and sustaining of long plasma columns depending on the pressure, the microwave power and the nature of the ‘plasma’ gas.
Technical specifications
SpecificationDescription
Pressure range A few 10-2 mbar up to atmospheric pressure
Gas type Ar, N2, O2, air, ...
Maximum power 6 kW
Application type Creation of radicals / reactive species, surface activation, PECVD, gas abatement, gasification, sterilization (UV)
Downstream source - 2.45 GHz WR340,
Argon at 1 mbar and at different microwave power levels
Downstream source, 2.45 GHz WR340

 

Surfaguide plasma source – 2.45 GHz


Surfaguide plasma source generates plasma in a dielectric tube via a surface wave. The main feature of the Surfaguide is the reduced height of the standard waveguide to locally intensify the microwave electric field and consequently, help with the ignition and sustaining the plasma. This source is principally suited for operation in the range of a few mbar up to atmospheric pressure.

Technical specifications
SpecificationDescription
Pressure range A few 10-2 mbar up to atmosperic pressure
Gas type Ar, N2, O2, air, ...
Maximum power 6 kW
Application type Creation of radicals / reactive species, surface activation, PECVD, gas abatement, gasification, sterilization (UV), nanopowder synthesis
 


Watercooled surfaguide WR340

 

Surfatron plasma source – 2.45 GHz

The Surfatron is a plasma reactor used for microwave propagation and designed to launch a surface electromagnetic wave. The surfatron is an effective plasma source for the production of reactive / excited species using a 6 mm diameter dielectric tubes.


Technical specifications
SpecificationDescription
Pressure range A few 10-2 mbar up to a few bars
Gas type Argon or argon based gas mixture at atmospheric pressure. All gases at reduced pressure.
Maximum power 300 W
Application type Creation of radicals / reactive species, surface activation, elementary analysis
Surfatron for power up to 300 W represented
with an argon plasma at atmospheric pressure - 2.45 GHz
When used for measurements and analysis, to avoid spurious spectral lines due to the mains 50/60 Hz we recommend using Sairem low ripple solid state microwave generator GMS 200 W.


Aura-Wave ECR Coaxial plasma source – 2.45 GHz


Aura-Wave has been designed to be self-adapted once the plasma ignited. A magnetic field combined to the electromagnetic wave allows the creation of plasma at low pressure - range of 10-3 mbar.



Technical specifications
SpecificationDescription
Pressure range A few 10-4 mbar up to 10-1 mbar
Gas type Ar, N2, O2, CH4, He, air, ...
Maximum power 200 W
Application type Large volume treatment, creation of radicals / reactive species, surface activation, PECVD, etching, surface treatment (nitruration, cleaning...), strerilization (reactive species / UV / ionic bombardment)

 


Aura-Wave ECR Coaxial lasma source


Argon, 2,5 × 10-3 mbar, 1W


N2 - Ar, 10-2 mbar,
8 Aura-Wave sources x 100W

Oxygen, 7 × 10-3 mbar, 190W

 
Combined with Sairem solid-state microwave generator, this source can maintain plasmas at power levels starting with 1 W. For small mismatches due to operating condition limitations, it is always possible to vary the frequency of the solid state generator to match the impedance.
In multi-source set up, and thanks to SAIREM solid state microwave modules, Aura-Wave is ideal for the production of large volumes of plasma [1-3] at operating pressures between 10-3 mbar and 10-1 mbar, allowing to obtain plasma density up to a few 1011 cm-3 in different gases.
 

Hi-Wave collisional plasma source – 2.45 GHz

The Hi-Wave microwave collisional plasma source has been designed to sustain over-dense microwave plasma from 10-2 mbar to a few 10-1 mbar and from a few watt whatever the gas.

Technical specifications
SpecificationDescription
Pressure range 10-2 mbar up to a few 10-1 mbar
Gas type Ar, O2, N2, air, H2, CH4
Maximum power 200 W
Application type Large surface treatment, creation of radicals / reactive species, PECVD, nanocrystalline diamond, etching, surface treatment, sterilization


Hi-Wave

 


Hi-Wave collisional plasma source


Air, 10-1 mbar, 200W


Oxygen, 6 × 10-2 mbar, 8 Hi-Wave sources × 200W


Nitrogen, 6 × 10-2 mbar, 8 Hi-Wave sources × 200W

 

Combined with Sairem solid-state microwave generator, this source can maintain plasma at power levels starting from a few W. To correct small mismatches due to change in operating conditions, the variable frequency function of the solid state generator helps with impedance matching.

In multi-source set up - matrix or crown configurations - Hi-Wave is ideal for the treatment of large surfaces [1;4] at operating pressures between 10-2 mbar and a few 10-1 mbar and allows to obtaining over-dense plasmas, plasma density higher than 1012 cm-3.

 

ICP plasma source – 13.56 MHz and 27.12 MHz


The ICP (Inductive Coupled Plasma) plasma source operates at radio-frequency and can generate inductive plasmas. The RF power is applied to the metal coiled around a dielectric tube. The variations of the magnetic field which is induced by the RF current flowing into the coils, together with the electric field created by the potential difference applied between the coils, allow creating plasma inside a dielectric tube.

Technical specifications
SpecificationDescription
Pressure range A few 10-2 mbar up to a few 100s mbar
Gas type Ar, N2, O2, air, ...
Maximum power 2 kW
Application type Creation of radicals / reactive species, surface activation, PECVD
 

 ICP plasma source: Argon 5.10-1 mbar, 100 W. Dielectric tube diameter = 55 mm

SAIREM PLASMA SOURCES
general presentation

 

[1] Latrasse L, Radoiu M, Jacomino J-M, Grandemenge A, Facility for microwave treatment of a load, WO 2012146870

[2] Béchu S, Bès A, Lacoste A, Pelletier J, Device and method for producing and/or confining a plasma, WO 2010049456

[3] Arnal Y, Béchu S, Lacoste A, Pelletier J, Device for confinement of a plasma within a volume, WO 2003083893

[4] Latrasse L, Lacoste A, Sirou J and Pelletier J, High density distributed microwave plasma sources in matrix configuration: concept, design and performance, Plasma Sources Sci. Technol. 16 pp. 7-12, 2007