Instruments Division
Testbourne LTD Instruments Division
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Compound Targets

Sputtering Target Compounds

A wide selection of compound based sputtering targets: oxides, nitrides, borides, sulfides, selenides, tellurides, carbides, crystalline and composite mixtures.

Testbourne compound target production methods include vacuum hot pressing, hot isostatic pressing, cold isostatic pressing, and cold press sintering. Depending on the required material targets can be manufactured from 1 inch up to 20 inches in diameter, rectangular targets are available from small to over 1000mm lengths in single or multi sections.

To achieve the best performance and to prevent the target from cracking or over-heating, we strongly recommend bonding any material target to a backing plate.
Please visit our Bonding Service Page for more information.

Testbourne compound target production methods include vacuum hot pressing, hot isostatic pressing, cold isostatic pressing, and cold press sintering. Depending on the required material targets can be manufactured from 1 inch up to 20 inches in diameter, rectangular targets are available from small to over 1000mm lengths in single or multi sections.

Borides are generally used for wear-resistant films, Titanium boride and zirconium boride films increase life time of cutting tools. Lanthanum boride coatings are thermionic conductors.
Borides
MaterialPurityDiameter or Width & LengthThicknessEnter Qty.
 If you require non-standard product, please Click Here for our custom product enquiry form.

Generally used for wear-resistant films and semi-conducting films.
Carbides
MaterialPurityDiameter or Width & LengthThicknessEnter Qty.
 If you require non-standard product, please Click Here for our custom product enquiry form.

MgF2 is commonly used in anti-reflection films, AlF3, BaF2, HfF4, LiF, Cryolite are used for low index films.
Fluorides
MaterialPurityDiameter or Width & LengthThicknessEnter Qty.
 If you require non-standard product, please Click Here for our custom product enquiry form.

Most common is Silicon nitride providing excellent insulation properties and deposits faster than SiO2. Titanium nitride coatings are used in wear resistance applications. Boron nitride films are used in dielectrics, photoconductors etc.
Nitrides
MaterialPurityDiameter or Width & LengthThicknessEnter Qty.
 If you require non-standard product, please Click Here for our custom product enquiry form.

Thin film capacitors, dielectric coatings beam splitter, solar cells, high index films, multilayer coatings.
Oxides
MaterialPurityDiameter or Width & LengthThicknessEnter Qty.
 If you require non-standard product, please Click Here for our custom product enquiry form.

Applications in resistance and semi-conducting films.
Silicides
MaterialPurityDiameter or Width & LengthThicknessEnter Qty.
 If you require non-standard product, please Click Here for our custom product enquiry form.

Multilayer thin films, photoconductive films, lubricant films.
Selenides
MaterialPurityDiameter or Width & LengthThicknessEnter Qty.
 If you require non-standard product, please Click Here for our custom product enquiry form.

MoS2, TaS2, WS2 commonly used in lubricant films on bearing and other moving parts. CdS used for photoconductive coatings.
Sulphides
MaterialPurityDiameter or Width & LengthThicknessEnter Qty.
 If you require non-standard product, please Click Here for our custom product enquiry form.

CdTe & ZnTe are being used in photoconductive films, PbTe best suited for high-index films for infrared filters and detectors.
Tellurides
MaterialPurityDiameter or Width & LengthThicknessEnter Qty.
 If you require non-standard product, please Click Here for our custom product enquiry form.


Unit 2, Hatch Industrial Park Greywell Road, Hatch Basingstoke Hampshire, RG24 7NG, England, UK.
High Purity Materials For Research, Development and Industry © 2013 Testbourne Limited
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